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Resist Coater Product List

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Large substrate resist coaters

Large substrate resist coaters

Of course, the airflow control inside the chamber, along with the excellent maintainability of the resist spin coat unit.

This is an introduction to our large substrate resist coaters. It is a resist spin coat unit designed for large substrates. In addition to airflow control within the chamber, it excels in maintainability, and we can also offer models equipped with automatic transport systems suitable for large substrates. *For more details, please refer to the PDF materials or feel free to contact us.

  • Photomask
  • Resist Coater

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Resist coater

Resist coater

Mass production support and small batch production support! A system that automatically handles the series of processes for resist coating, baking, and cooling.

We would like to introduce the "Resist Coater" that we handle. We can also accommodate manual specifications upon request. The work sizes supported are Φ2" to 12" wafers and 100□ to 320□ mm square substrates. The work materials include Si, SiC, GaN, GaAs, InP, LT/LN, ceramics, quartz, resin, glass, etc. The viscosity of the coating material ranges from 100CP to 8,000CP. 【Specifications (partial)】 ■ Work transport: Multi-joint clean robot with backside suction method ■ Two-stage cup (upper stage: resist, lower stage: rinse) ■ Resist liquid: Photoresist, polyimide-based (can accommodate built-in canisters) ■ Bake: 90℃ to 120℃ ±1℃ (proximity/contact selection) ■ Cool plate: 10℃ to 25℃ (proximity/contact selection) *For more details, please download the PDF or feel free to contact us.

  • レジストコーター2.png
  • Resist Device
  • Resist Coater

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Semi-Automatic Resist Coater

Semi-Automatic Resist Coater

It is possible to select an optimal acceleration based on the viscosity of the resist coating agent! We also pay attention to maintainability.

This is an introduction to our small resist coater. Resist coating material is applied to glass substrates using a spinner. We pay attention to airflow control within the chamber and maintenance, allowing for optimal acceleration selection based on the viscosity of the resist coating material. *For more details, please refer to the PDF document or feel free to contact us. Wafer, batch-type cleaning equipment, coating and developing equipment, spin cleaning equipment, spin coater, semiconductor manufacturing equipment, resist coating equipment, coating equipment, coating uniformity, low price, photolithography process, batch substrate cleaning machine, batch spin cleaning machine, surface treatment, wafer cleaning equipment.

  • Photomask
  • Resist Coater

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